![](/img/cover-not-exists.png)
Overcoat Processing Technique for a Highly-sensitive Chemically Amplified Positive X-ray Resist.
Ban, Hiroshi, Deguchi, Kimiyoshi, Tanaka, Akinobu, Nakamura, JiroVolume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.17
File:
PDF, 337 KB
english, 1994