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Lithographic characteristics of alicyclic polymer based ArF single layer resists.
Takahashi, Makoto, Takechi, Satoshi, Nozaki, Koji, Kaimoto, Yuko, Abe, NaomichiVolume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.31
File:
PDF, 321 KB
english, 1994