The Lithographic Performance and Contamination Resistance...

Journal of Photopolymer Science and Technology 1994 Vol. 7; Iss. 3

The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists.

Breyta, Greg, Hofer, Donald C., Ito, Hiroshi, Seeger, Dave, Petrillo, Karen, Moritz, Holger, Fischer, Thomas
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Volume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.449
File:
PDF, 504 KB
english, 1994
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