Sub 0.25 micron resolution and profile control in photoresists under E-beam exposure.
KUDRYASHOV, VLADIMIR, BORZEIKO, TANYA, KRASNOV, VLADIMIR, ARISTOV, VITALIYVolume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.569
File:
PDF, 368 KB
english, 1994