Application of Photosensitive Polyimide: Mask Saving Process for Buffer Coating.
ISOBE, AKIRA, SHINOHARA, MASAHIDEVolume:
9
Year:
1996
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.9.315
File:
PDF, 386 KB
english, 1996