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Linewidth fluctuations caused by polymer aggregates in resist films.
Yamaguchi, Toru, Namatsu, Hideo, Nagase, Masao, Yamazaki, Kenji, Kurihara, KenjiVolume:
10
Year:
1997
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.10.635
File:
PDF, 346 KB
english, 1997