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Negative Electron Beam Resists Using Ring-Chain Tautomerism of Benzoic Acid Derivatives
Uchino, Shou-ichi, Kimura, KaoriVolume:
12
Year:
1999
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.12.359
File:
PDF, 264 KB
english, 1999