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Sub 100 nm Pattern Fabrication Using Plasma Grafted Styrene Resist and E-Beam or Synchrotron Radiation Excited Etching.
Suzuki, Mikinori, Ogawa, Shinji, Phatak, Girish J., Morita, ShinzoVolume:
12
Year:
1999
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.12.583
File:
PDF, 146 KB
english, 1999