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Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography.
Schmaljohann, Dirk, Young, Cheol Bae, Dai, Junyan, Weibel, Gina L., Hamad, Alyssandrea H., Ober, Christopher K.Volume:
13
Year:
2000
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.13.451
File:
PDF, 545 KB
english, 2000