A New 193 nm Single Layer Resist Based on Cycloolefin Maleic Anhydride Polymers.
Lee, Si-Hyeung, Kwon, Ki-Young, Jung, Dong-Won, Lee, Sook, Yoon, Kwang-Sub, Kim, Hyun-Woo, Choi, Sang-Jun, Woo, Sang-Gyun, Moon, Joo-TaeVolume:
13
Year:
2000
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.13.651
File:
PDF, 294 KB
english, 2000