Advanced Resist Design Using AFM Analysis for ArF...

Journal of Photopolymer Science and Technology 2003 Vol. 16; Iss. 3

Advanced Resist Design Using AFM Analysis for ArF Lithography

Kubota, Naotaka, Hayashi, Tomohiko, Iwai, Takeshi, Komano, Hiroshi, Kawai, Akira
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Volume:
16
Year:
2003
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.16.467
File:
PDF, 1.47 MB
2003
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