Preparation and Two-Photon Lithography of a Sulfur...

Journal of Photopolymer Science and Technology 2004 Vol. 17; Iss. 1

Preparation and Two-Photon Lithography of a Sulfur Containing Resin with High Refractive Index

Murakami, Yasuharu, Coenjarts, Christopher A., Ober, Christopher K.
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Volume:
17
Year:
2004
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.17.115
File:
PDF, 475 KB
2004
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