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Acid Components in Outgassing from F2 Resists: A Study Using In-Situ QCM Technique
Shirai, Masamitsu, Takashiba, Shinichi, Horiguchi, Yusuke, Irie, Shigeo, Itani, ToshioVolume:
17
Year:
2004
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.17.645
File:
PDF, 408 KB
2004