Fabrication of sub-100nm Patterns using Near-field Mask...

Journal of Photopolymer Science and Technology 2005 Vol. 18; Iss. 3

Fabrication of sub-100nm Patterns using Near-field Mask Lithography with Ultra-thin Resist Process

Ito, Toshiki, Ogino, Masaya, Yamanaka, Tomohiro, Inao, Yasuhisa, Yamaguchi, Takako, Mizutani, Natsuhiko, Kuroda, Ryo
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Volume:
18
Year:
2005
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.18.435
File:
PDF, 735 KB
2005
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