New PFOS Free Photoresist Systems for EUV Lithography

Ayothi, Ramakrishnan, Chang, Seung Wook, Felix, Nelson, Cao, Heiji B., Deng, Hai, Yueh, Wang, Ober, Christopher K.

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Volume:

Year:

2006

Journal:

Journal of Photopolymer Science and Technology

DOI:

10.2494/photopolymer.19.515

File:

PDF, 2.22 MB

2006

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