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Design Considerations for EUV Resist Materials
Thackeray, James W., Aqad, Emad, Kang, Su Jin, Spear-Alfonso, KathleenVolume:
22
Year:
2009
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.22.65
File:
PDF, 1.48 MB
english, 2009