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Non Topcoat Self-freezing Photoresist for Double Patterning Process
Ito, Koji, Mita, Michihiro, Wakamatsu, Goji, Anno, Yusuke, Fujisawa, Tomohisa, Osaki, Hitoshi, Hoshiko, Kenji, Tanaka, Hiromitsu, Nishimura, Yukio, Sugiura, Makoto, Yamaguchi, Yoshikazu, Shimokawa, TsVolume:
23
Year:
2010
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.23.199
File:
PDF, 530 KB
english, 2010