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Progress in Spin-on Hard Mask Materials for Advanced Lithography
Padmanaban, Munirathna, Cho, JoonYeon, Kudo, Takanori, Rahman, Dalil, Yao, Huirong, McKenzie, Douglas, Dioses, Alberto, Mullen, Salem, Wolfer, Elizabeth, Yamamoto, Kazuma, Cao, Yi, Her, YoungJunVolume:
27
Year:
2014
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.27.503
File:
PDF, 1.45 MB
english, 2014