Positive Tone Nanoparticle Photoresists: New Insight on the Patterning Mechanism
Yu, Mufei, Xu, Hong, Kosma, Vasiliki, Odent, Jeremy, Kasahara, Kazuki, Giannelis, Emmanuel, Ober, ChristopherVolume:
29
Year:
2016
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.29.509
File:
PDF, 1.52 MB
english, 2016