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Advanced Formulation for DSA Resists
Nicolet, Celia, Chevalier, Xavier, Beausoleil, Julien, Sakavuyi, Kaumba, Berron, John, Brakensiek, Nick, Jurajda, Darron, Navarro, Christophe, Cayrefourcq, IanVolume:
29
Year:
2016
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.29.671
File:
PDF, 2.02 MB
english, 2016