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Recent progress in chemical amplification resists for excimer laser lithography: Revese polarity change via pinacol rearrangement.
ITO, Hiroshi, SOORIYAKUMARAN, R., MASH, Eugene A.Volume:
4
Year:
1991
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.4.319
File:
PDF, 676 KB
english, 1991