Pattern Profile Improvement of Negative Chemical Amplification Resist by Acid Trap Reagent Soaking for KrF Excimer Laser Lithography.
KASUGA, Takashi, TOMO, Yoichi, TSUMORI, ToshiroVolume:
4
Year:
1991
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.4.473
File:
PDF, 374 KB
english, 1991