Photochemical and photophysical studies on chemically amplified resists.
HACKER, NIGEL P., HOFER, DONALD C., WELSH, KEVIN M.Volume:
5
Year:
1992
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.5.35
File:
PDF, 424 KB
english, 1992