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KrF trilayer resist system using azide-phenol resin resist.
ASAI, N., IMAI, A., UENO, T., AZUMA, Y., MIYAZAKI, T., TANAKA, T., OKAZAKI, S.Volume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.23
File:
PDF, 306 KB
english, 1994