Ablation of Si-containing Polymers: Application to X-ray...

Journal of Photopolymer Science and Technology 1994 Vol. 7; Iss. 3

Ablation of Si-containing Polymers: Application to X-ray Lithography.

Yamaguchi, Atsuko, Ogawa, Taro, Soga, Takashi, Tachibana, Hiroaki, Matsumoto, Mutsuyoshi, Oizumi, Hiroaki, Takeda, Eiji
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Volume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.607
File:
PDF, 419 KB
english, 1994
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