Effect of residual solvent on pattern profile and...

Journal of Photopolymer Science and Technology 1995 Vol. 8; Iss. 2

Effect of residual solvent on pattern profile and mechanical characteristic of photosensitive polyimides.

Nishiki, Masashi, Kousaka, Akihiro, Yamaoka, Tsuguo, Koizumi, Shigeru
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Volume:
8
Year:
1995
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.8.329
File:
PDF, 136 KB
english, 1995
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