Photochemical Acid Generation and Resist Application of...

Journal of Photopolymer Science and Technology 1996 Vol. 9; Iss. 4

Photochemical Acid Generation and Resist Application of Camphorsulfonyloxymaleimide Copolymers.

CHUNG, CHAN-MOON, AHN, KWANG-DUK
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Volume:
9
Year:
1996
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.9.553
File:
PDF, 163 KB
english, 1996
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