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1,3,5-Tris(4-(tert-Butoxycarbonylmethoxy)-phenyl)benzene as a Novel Electron-beam Positive Resist for Nanometer Lithography.
YOSHIIWA, MOTOKO, KAGEYAMA, HIROSHI, WAKAYA, FUJIO, TAKAI, MIKIO, GAMO, KENJI, SHIROTA, YASUHIKOVolume:
9
Year:
1996
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.9.57
File:
PDF, 110 KB
english, 1996