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Effects of N Doping in Ru-Ta on Barrier Property and Reliability Performance for Cu Interconnects
Torazawa, Naoki, Hinomura, Tooru, Hirao, Shuji, Kobori, Etsuyoshi, Korogi, Hayato, Matsumoto, SusumuVolume:
5
Year:
2016
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0271607jss
File:
PDF, 1.01 MB
english, 2016