Ion Bombardment Effects on Internal Stress of Ni Thin Film during Sputter Deposition Process
Toyoda, Ryoichi, Toya, Soichiro, Hashimoto, Maki, Kohri, Ami, Matsumura, YoshihitoVolume:
78
Year:
2014
Language:
english
Journal:
Journal of the Japan Institute of Metals and Materials
DOI:
10.2320/jinstmet.jbw201302
File:
PDF, 1.41 MB
english, 2014