Photo Alignment Materials with High Sensitivity to Near UV...

Journal of Photopolymer Science and Technology 1998 Vol. 11; Iss. 2

Photo Alignment Materials with High Sensitivity to Near UV Light.

Makita, Yutaka, Natsui, Toru, Kimura, Shin-ichi, Nakata, Shoichi, Kimura, Masayuki, Matsuki, Yasuo, Takeuchi, Yasumasa
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Volume:
11
Year:
1998
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.11.187
File:
PDF, 352 KB
english, 1998
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