Study of advanced 193nm resists. Material properties and lithographic performance.
Mortini, Benedicte, Gally, Severine, Sassoulas, Pierre-Olivier, Prola, Alain, Paniez, Patrick J.Volume:
12
Year:
1999
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.12.515
File:
PDF, 643 KB
english, 1999