Advanced Materials for 193-nm Resists.

Journal of Photopolymer Science and Technology 2000 Vol. 13; Iss. 4

Advanced Materials for 193-nm Resists.

Shida, Naomi, Ushirogouchi, Tohru, Asakawa, Koji, Okino, Takeshi, Saito, Satoshi, Funaki, Yoshinori, Takaragi, Akira, Tsutsumi, Kiyoharu, Inoue, Keizo, Nakano, Tatsuya
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Volume:
13
Year:
2000
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.13.601
File:
PDF, 333 KB
english, 2000
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