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A Novel Platform for Production-worthy ArF Resist

A Novel Platform for Production-worthy ArF Resist

Kim, Hyun-Woo, Choi, Sang-Jun, Jung, Dong-Won, Lee, Sook, Lee, Sung-Ho, Kang, Yool, Woo, Sang-Gyun, Moon, Joo-Tae, Kavanagh, Robert, Barclay, George, Orsula, George, Mattia, Joe, Caporale, Stefan, Ada
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Volume:
14
Year:
2001
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.14.363
File:
PDF, 668 KB
english, 2001
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