Application of VEMA type ArF Resist to Sub-100nm...

Journal of Photopolymer Science and Technology 2002 Vol. 15; Iss. 3

Application of VEMA type ArF Resist to Sub-100nm Lithography.

Kim, Hyun-Woo, Lee, Sook, Choi, Sang-Jun, Woo, Sang-Gyun, Chae, Yun-Sook, Kim, Jisoo, Moon, Joo-Tae, Kavanagh, Robert, Barclay, George
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Volume:
15
Year:
2002
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.15.529
File:
PDF, 1.00 MB
english, 2002
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