Newly developed acrylic copolymers for ArF photoresist.

Journal of Photopolymer Science and Technology 2002 Vol. 15; Iss. 4

Newly developed acrylic copolymers for ArF photoresist.

Kamon, Yoshihiro, Momose, Hikaru, Kuwano, Hideaki, Fujiwara, Tadayuki, Fujimoto, Masaharu
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Volume:
15
Year:
2002
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.15.535
File:
PDF, 743 KB
english, 2002
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