Novel Photoacid Generators for Chemically Amplified Resists
Asakura, Toshikage, Yamato, Hitoshi, Matsumoto, Akira, Murer, Peter, Ohwa, MasakiVolume:
16
Year:
2003
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.16.335
File:
PDF, 1.02 MB
2003