High Refractive Index Fluid for Next Generation ArF Immersion Lithography
Furukawa, Taiichi, Hieda, Katsuhiko, Wang, Yong, Miyamatsu, Takashi, Yamada, Kinji, Tominaga, Tetsuo, Makita, Yutaka, Nakagawa, Hiroki, Nakamura, Atshushi, Shima, Motoyuki, Shimokawa, TsutomuVolume:
19
Year:
2006
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.19.641
File:
PDF, 1.64 MB
2006