Thermolysis of Polymethacrylates for 193 nm Resist

Journal of Photopolymer Science and Technology 2006 Vol. 19; Iss. 6

Thermolysis of Polymethacrylates for 193 nm Resist

Ogata, Toshiyuki, Kasai, Kohei, Matsumaru, Shogo, Takahashi, Motoki, Hada, Hideo, Shirai, Masamitwsu
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Volume:
19
Year:
2006
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.19.705
File:
PDF, 572 KB
2006
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