Pathway to sub-30nm Resolution in EUV Lithography

Journal of Photopolymer Science and Technology 2007 Vol. 20; Iss. 3

Pathway to sub-30nm Resolution in EUV Lithography

Thakerlay, James W., Nassar, Roger A., Spear-Alfonso, Kathleen, Brainard, Robert, Goldfarb, Dario, Wallow, Thomas, Wei, Yayi, Montgomery, Warren, Petrillo, Karen, Wood, Robert, Koay, Chief-seng, Macke
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Volume:
20
Year:
2007
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.20.411
File:
PDF, 1.35 MB
english, 2007
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