Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer
Kozawa, Takahiro, Tagawa, Seiichi, Kai, Toshiyuki, Shimokawa, TsutomuVolume:
20
Year:
2007
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.20.577
File:
PDF, 578 KB
english, 2007