Double Patterning Materials for Sub-40nm Application

Journal of Photopolymer Science and Technology 2008 Vol. 21; Iss. 5

Double Patterning Materials for Sub-40nm Application

Anno, Yusuke, Kakizawa, Tomohiro, Hori, Masafumi, Soyano, Akimasa, Fujiwara, Koichi, Nakamura, Atsushi, Sugiura, Makoto, Yamaguchi, Yoshikazu, Shimokawa, Tsutomu
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Volume:
21
Year:
2008
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.21.691
File:
PDF, 671 KB
english, 2008
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