Study on Curing Characteristic of UV Nanoimprint Resist

Journal of Photopolymer Science and Technology 2012 Vol. 25; Iss. 2

Study on Curing Characteristic of UV Nanoimprint Resist

Suzuki, Ryusuke, Sakai, Nobuji, Ohsaki, Takeshi, Sekiguchi, Atsushi, Kawata, Hiroyuki, Hirai, Yoshihiko
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Volume:
25
Year:
2012
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.25.211
File:
PDF, 418 KB
english, 2012
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