Nanoparticle photoresists from HfO2 and ZrO2 for EUV...

Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning

Trikeriotis, Markos, Krysaki, Marie, Chung, Yeon Sook, Ouyang, Christine, Cardineau, Brian, Brainard, Robert, Ober, Christopher K., Giannelis, Emmanuel P., Cho, Kyiungyong
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Volume:
25
Year:
2012
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.25.583
File:
PDF, 1.62 MB
2012
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