![](/img/cover-not-exists.png)
Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning
Trikeriotis, Markos, Krysaki, Marie, Chung, Yeon Sook, Ouyang, Christine, Cardineau, Brian, Brainard, Robert, Ober, Christopher K., Giannelis, Emmanuel P., Cho, KyiungyongVolume:
25
Year:
2012
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.25.583
File:
PDF, 1.62 MB
2012