The Physics of EUV Photoresist and How It Drives Strategies...

The Physics of EUV Photoresist and How It Drives Strategies for Improvement

Mark, Neisser, Cho, Kyoungyong, Petrillo, Karen
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Volume:
25
Year:
2012
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.25.87
File:
PDF, 389 KB
english, 2012
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