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Anisotropic Oxygen Reactive Ion Etching for Removing Residual Layers from 45 nm-width Imprint Patterns
Uehara, Takuya, Kubo, Shoichi, Hiroshiba, Nobuya, Nakagawa, MasaruVolume:
29
Year:
2016
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.29.201
File:
PDF, 819 KB
english, 2016