Electron-Beam Induced Shrinkage Effects on Line-Space Patterns of ZEP Resist
Dinh, Cong Que, Oshima, Akihiro, Nishijima, Shigehiro, Tagawa, SeiichiVolume:
29
Year:
2016
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.29.81
File:
PDF, 798 KB
english, 2016