Some resists based on chemically-amplified crosslinking of...

Journal of Photopolymer Science and Technology 1990 Vol. 3; Iss. 3

Some resists based on chemically-amplified crosslinking of phenolic polymers.

Bohland, John F., Calabrese, Gary S., Cronin, Michael F., Canistro, Diane, Fedynyshyn, Theodore H., Ferrari, Joseph, Lamola, A. A., Orsula, George W., Pavelchek, Edward K., Sinta, Roger, Thackeray, Ja
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Volume:
3
Year:
1990
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.3.355
File:
PDF, 720 KB
english, 1990
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