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Preparation of chemically amplified photoresists with N-hydroxyphthalimide styrenesulfonate groups and their properties.
Chae, Kyu Ho, Oh, Yark JunVolume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.183
File:
PDF, 163 KB
english, 1994