Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.
ITO, Hiroshi, BREYTA, Greg, HOFER, Don, SOORIYAKUMARAN, R., PETRILLO, Karen, SEEGER, DavidVolume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.433
File:
PDF, 584 KB
english, 1994